Adliswil, Switzerland

Mark I Lutwyche


Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 65(Granted Patents)


Company Filing History:


Years Active: 2002-2005

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4 patents (USPTO):Explore Patents

Title: Mark I Lutwyche: Innovator in Surface Modification Technologies

Introduction

Mark I Lutwyche is a notable inventor based in Adliswil, Switzerland. He has made significant contributions to the field of surface modification technologies. With a total of 4 patents to his name, Lutwyche's work has had a considerable impact on various applications in technology.

Latest Patents

One of Lutwyche's latest patents is a device for contacting and/or modifying a surface that features a cantilever. This device is designed with a cantilever connected to an almost plane carrier element, which remains apart from the surface being modified. The cantilever has a tip at its loose end that is in close contact with the surface. The design proposes that the cantilever stands out from the plane of the carrier element. Additionally, Lutwyche has developed a method for producing the cantilever with a tip at its loose end. This innovative device is suitable for thermomechanical writing, thermal readout of binary information, lithographic and imaging techniques, and surface modification.

Career Highlights

Mark I Lutwyche is currently associated with the International Business Machines Corporation (IBM). His work at IBM has allowed him to explore and develop advanced technologies in surface modification. Lutwyche's inventions have contributed to the advancement of various technological processes.

Collaborations

Throughout his career, Lutwyche has collaborated with notable colleagues, including Peter Vettiger and Ute Drechsler. These collaborations have further enhanced the scope and impact of his inventions.

Conclusion

Mark I Lutwyche is a distinguished inventor whose work in surface modification technologies has led to significant advancements in the field. His innovative patents and collaborations with esteemed colleagues continue to influence the technological landscape.

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