Calgary, Canada

Mark Hodder

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Mark Hodder - Innovator in Geothermal Well Drilling

Introduction

Mark Hodder is a notable inventor based in Calgary, Canada. He has made significant contributions to the field of geothermal energy, particularly in the area of well drilling. His innovative approach has the potential to enhance the efficiency and effectiveness of geothermal energy extraction.

Latest Patents

Mark Hodder holds a patent for a method titled "Cooling for Geothermal Well Drilling." This invention involves drilling a geothermal well in a subterranean zone where the rock temperature is at least 250 degrees Celsius. The method includes flowing a drilling fluid at a temperature that maintains a difference of at least 100 degrees Celsius between the inherent temperature of the rock and the temperature of the drilling fluid at the rock face. This innovative technique aims to improve the drilling process in high-temperature environments.

Career Highlights

Mark Hodder is associated with Eavor Technologies Inc., a company focused on advancing geothermal energy technologies. His work at Eavor Technologies has positioned him as a key player in the renewable energy sector. With a patent portfolio that includes his groundbreaking method for geothermal well drilling, he continues to push the boundaries of innovation in this field.

Collaborations

Mark collaborates with talented professionals in his field, including Matthew Toews and Michael Holmes. Their combined expertise contributes to the development of cutting-edge technologies in geothermal energy.

Conclusion

Mark Hodder's contributions to geothermal well drilling exemplify the importance of innovation in renewable energy. His patented method not only enhances drilling efficiency but also supports the broader goal of sustainable energy solutions.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…