Mark D Abbey

Title: Mark D Abbey: Innovator in Precision Center Guiding Technology

Introduction

Mark D Abbey is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photographic technology, particularly in the precision guiding of light-sensitive materials. His innovative approach has led to the development of a unique apparatus that enhances the accuracy of photographic emulsion applications.

Latest Patents

Mark D Abbey holds 1 patent for his invention titled "Precision center guiding of a web coated with light sensitive." This patent describes an apparatus and method for detecting the edge of a light-sensitive photographic emulsion on a support. The invention utilizes a pair of collimated infrared light sources to illuminate each edge of the support at specific angles. Above the edges, CCD cameras detect the scattered light, allowing for precise positioning of the support based on the emulsion's edges.

Career Highlights

Mark D Abbey has had a distinguished career at Eastman Kodak Company, where he has applied his expertise in imaging technology. His work has contributed to advancements in the field, particularly in improving the quality and efficiency of photographic processes. Abbey's innovative spirit and technical knowledge have made him a valuable asset to his team.

Collaborations

Throughout his career, Mark D Abbey has collaborated with esteemed colleagues, including John Philip Wysokowski and Ernest A Graff. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the photographic industry.

Conclusion

Mark D Abbey's contributions to precision center guiding technology exemplify the impact of innovation in the field of photography. His patent and work at Eastman Kodak Company highlight his dedication to advancing imaging technology. Abbey's achievements serve as an inspiration for future inventors in the industry.