San Jose, CA, United States of America

Mark Contreras


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 64(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Mark Contreras: Innovator in Electrostatic Chuck Technology

Introduction

Mark Contreras is a notable inventor based in San Jose, California. He has made significant contributions to the field of electrostatic chuck technology, particularly in the design of devices used in semiconductor processing. His innovative approach has led to the development of a patent that enhances the reliability and efficiency of electrostatic chucks.

Latest Patents

Mark Contreras holds a patent for a "Multi-electrode electrostatic chuck having fuses in hollow cavities." This invention is designed to provide a failure-resistant electrostatic chuck for holding substrates during processing. The chuck comprises one or more electrodes covered by an insulator, which can electrostatically hold a substrate when a voltage is applied. The design includes an electrical power bus with output terminals that conduct voltage to the electrodes. Notably, the fuses are strategically positioned in hollow cavities within the insulator, allowing for electrical disconnection of an electrode when exposed to a plasma process environment.

Career Highlights

Mark Contreras is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on advancing technologies that improve manufacturing processes for electronic devices. His innovative contributions have positioned him as a key player in the field.

Collaborations

Throughout his career, Mark has collaborated with talented individuals such as Jon T Clinton and Anand H Kumar. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Mark Contreras exemplifies the spirit of innovation in the semiconductor industry through his patented technologies and collaborative efforts. His work continues to influence the advancement of electrostatic chuck technology, making significant strides in the field.

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