Annandale, NJ, United States of America

Marissa Anne Linne


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Marissa Anne Linne: Innovator in Imaging Technology

Introduction

Marissa Anne Linne is a notable inventor based in Annandale, NJ (US). She has made significant contributions to the field of imaging technology, particularly through her innovative patent work.

Latest Patents

One of her key patents is titled "Imaging member with fluorosulfonamide-containing overcoat layer." This invention includes a supporting substrate, an optional hole blocking layer, an optional adhesive layer, an imaging layer, and an overcoat layer. The overcoat layer comprises a fluorosulfonamide and can further include a charge transport compound and a melamine resin. This patent showcases her expertise and creativity in developing advanced imaging solutions. Marissa holds 1 patent.

Career Highlights

Marissa is currently employed at Xerox Corporation, a leading company in the field of imaging and printing technology. Her work at Xerox has allowed her to be at the forefront of innovation in imaging members, contributing to the company's reputation for excellence in technology.

Collaborations

Throughout her career, Marissa has collaborated with talented individuals such as Jin Wu and David M Skinner. These collaborations have enriched her work and fostered a creative environment for innovation.

Conclusion

Marissa Anne Linne is a distinguished inventor whose contributions to imaging technology are noteworthy. Her innovative patent and work at Xerox Corporation highlight her commitment to advancing the field. Her collaborations further enhance her impact in the industry.

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