Company Filing History:
Years Active: 2009
Title: **Innovator Spotlight: Mario Schiffler and His Contributions to EUV Lithography**
Introduction
Mario Schiffler, an accomplished inventor based in Oepfershausen, Germany, has made significant strides in the field of lithography, particularly with his innovative work on mask blanks for extreme ultraviolet (EUV) lithography. With a unique approach to designing high-performance materials, Schiffler has secured a patent that highlights his expertise and contribution to advancing technology in this specialized area.
Latest Patents
Mario Schiffler holds a notable patent titled "Mask blank for use in EUV lithography and method for its production." This invention focuses on creating a mask blank that consists of a substrate featuring a coated front side designed for EUV lithography applications. The back side of this substrate is equipped with an electrically conductive coating that boasts enhanced abrasion resistance and adhesion properties, adhering to established German Industry Standards (DIN 58196-4, DIN 58196-5, and DIN 58196-6). The application of this electrically conductive coating is achieved through ion-beam-assisted sputtering, ensuring durability in handling and usability. This innovative mask blank can be effectively gripped and managed using electrostatic holding devices without risking wear from abrasion.
Career Highlights
Mario Schiffler works at Schott AG, a renowned company recognized for its glass and optics technologies. His role at Schott AG underscores his commitment to leading-edge research and innovation, particularly in the realm of lithography, which is vital for the advancement of semiconductor manufacturing. Schiffler's patent not only reflects his skills as an inventor but also exemplifies the strong research culture fostered at Schott AG.
Collaborations
Throughout his career, Mario Schiffler has collaborated with esteemed colleagues such as Lutz Aschke and Markus Renno. These collaborations have likely contributed to the development and fine-tuning of innovative solutions within the highly competitive field of lithography, allowing for the exchange of ideas and expertise that drives the industry forward.
Conclusion
In conclusion, Mario Schiffler's contributions through his patented innovation have significantly impacted the field of EUV lithography. As technology continues to advance, the importance of such innovations cannot be overstated. With his ongoing work at Schott AG and partnerships with fellow experts, Schiffler remains a pivotal figure in the development of materials that enhance semiconductor manufacturing processes, paving the way for future advancements in the industry.