Company Filing History:
Years Active: 2001
Title: The Innovative Contributions of Marilyn R Leduc
Introduction
Marilyn R Leduc is a notable inventor based in Williston, Vermont. She has made significant contributions to the field of polymer removal, particularly in the context of semiconductor devices. Her work has implications for the rework and maintenance of electronic circuitry.
Latest Patents
Marilyn R Leduc holds a patent for a "Method for removal of cured polyimide and other polymers." This invention involves non-aqueous cleaning compositions that effectively remove cured polyimides and other polymers from metal circuitry substrates, such as semiconductor devices. The cleaning compositions consist primarily of alkanolamines, specifically monoethanolamine or mixtures of monoethanolamine and diethanolamine, and may include a solvent like NMP in amounts less than about 50% by weight. The method she developed is crucial for maintaining the integrity of semiconductor devices during rework processes.
Career Highlights
Marilyn R Leduc is associated with International Business Machines Corporation (IBM), where she has contributed her expertise in polymer chemistry and cleaning technologies. Her innovative approach has led to advancements in the efficiency and effectiveness of cleaning processes in the semiconductor industry.
Collaborations
Throughout her career, Marilyn has worked alongside esteemed colleagues such as Harold G Linde and Gary P Viens. Their collaborative efforts have furthered the development of technologies that enhance the performance and reliability of electronic devices.
Conclusion
Marilyn R Leduc's contributions to the field of polymer removal and semiconductor maintenance highlight her innovative spirit and dedication to advancing technology. Her patent and work at IBM reflect her significant impact on the industry.