Company Filing History:
3 out of 1,173 
2 out of 295 
Years Active: 1994-2005
Title: Maria T Sypek: Innovator in Photosensitive Compositions
Introduction
Maria T Sypek is a notable inventor based in Belchertown, MA (US). She has made significant contributions to the field of photosensitive compositions, holding a total of 5 patents. Her work focuses on the development of imageable elements that utilize aromatic diazonium salt containing compounds.
Latest Patents
One of her latest patents involves photosensitive compositions that incorporate mixtures of alkoxy and non-alkoxy diazonium salt containing compounds. This invention includes an imageable element that can consist of an imaging layer with an aromatic diazonium salt containing compound having an alkoxy substituent, alongside another compound free of an alkoxy substituent. The imaging layer is designed to contain at least 10 weight percent of the total aromatic diazonium salt containing compounds. The molar ratio of these compounds ranges from about 1.0:1 to 70:1. Upon imagewise exposure and development, an imaged element is produced, which can be utilized in a dry printing press with lithographic ink to create printed stock.
Career Highlights
Maria has worked with prominent companies in the industry, including International Paper Company and Kodak Polychrome Graphics, GmbH. Her experience in these organizations has allowed her to refine her expertise in the field of photosensitive materials and printing technologies.
Collaborations
Throughout her career, Maria has collaborated with notable colleagues such as Paul A Perron and Gary V Grosclaude. These partnerships have contributed to her innovative work and advancements in her field.
Conclusion
Maria T Sypek is a distinguished inventor whose contributions to photosensitive compositions have made a significant impact in the printing industry. Her innovative patents and collaborations highlight her expertise and dedication to advancing technology in this area.