Company Filing History:
Years Active: 2001-2002
Title: Maria Luisa Polignano: Innovator in Semiconductor Technology
Introduction
Maria Luisa Polignano is a distinguished inventor based in Cambiago, Italy. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative spirit and technical expertise.
Latest Patents
Her latest patents include the "Characterization of a semiconductor/dielectric interface by photocurrent measurements." This invention involves characterizing an interface between a semiconductor substrate and a dielectric layer through photocurrent measurements induced by a laser beam. The photocurrent is collected via a Schottky contact, which is established by inversely biasing a first electrolyte. This electrolyte can etch any native or thermal oxide present on the contact area. Additionally, the surface potential of the interface is controlled by a gate electrode established on the dielectric layer using a second electrolyte that is non-aggressive to the dielectric material.
Another notable patent is the "Determination of the thickness of a denuded zone in a silicon wafer." This invention estimates the depth of a denuded layer in a monocrystalline semiconductor wafer in a nondestructive manner. The depth is determined by measuring the lifetime or diffusion length of injected excess minority charge carriers on the wafer's surface. The calculation is performed using a best-fit procedure or numerical processing based on diffusion equations.
Career Highlights
Maria Luisa Polignano works at STMicroelectronics S.r.l., where she applies her expertise in semiconductor technology. Her work has significantly advanced the understanding and characterization of semiconductor interfaces.
Collaborations
She collaborates with notable colleagues, including Marzio Brambilla and Francesco Cazzaniga, contributing to a dynamic and innovative work environment.
Conclusion
Maria Luisa Polignano is a remarkable inventor whose work in semiconductor technology continues to influence the field. Her patents reflect her dedication to innovation and her commitment to advancing technology.