Company Filing History:
Years Active: 2003
Title: Maria Iavarone: Innovator in High Aspect Ratio Structures
Introduction
Maria Iavarone is a distinguished inventor based in Casoria, Italy. He has made significant contributions to the field of materials science, particularly in the fabrication of high aspect ratio structures using perovskite materials. His innovative approach has the potential to advance various applications in superconductivity and nanotechnology.
Latest Patents
Iavarone holds a patent for a method of fabricating high aspect ratio ceramic structures. This method involves exposing a selected portion of perovskite or perovskite-like crystalline material to a high energy ion beam. The exposure time is sufficient to create substantially parallel columnar defects in the crystalline material. Following this, selected portions of the material are etched, resulting in structures with high aspect ratios of not less than 2 to 1. The etching process is accomplished through optical or PMMA lithography. Additionally, his patent describes a superconducting ceramic structure that operates at temperatures ranging from about 10 K to about 90 K, featuring substantially parallel columnar defects.
Career Highlights
Maria Iavarone is affiliated with the University of Chicago, where he continues to engage in groundbreaking research. His work has garnered attention for its innovative techniques and potential applications in various scientific fields. With a focus on high aspect ratio structures, Iavarone's contributions are paving the way for advancements in material science.
Collaborations
Iavarone has collaborated with notable researchers, including Goran T Karapetrov and Wai-Kwong Kwok. These collaborations have further enriched his research and expanded the impact of his work in the scientific community.
Conclusion
Maria Iavarone is a prominent inventor whose work in high aspect ratio structures is shaping the future of materials science. His innovative methods and collaborations highlight the importance of research in advancing technology.