Mari Usui

Title: Mari Usui - Innovator in Etching Technology

Introduction

Mari Usui is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of etching technology, particularly in the development of etchants for oxides containing indium and gallium. Her innovative work has implications for various applications in electronics and materials science.

Latest Patents

Mari Usui holds a patent for an etchant and etching process specifically designed for oxides that contain at least indium and gallium. The patent, titled "Etchant and etching process for oxides containing at least indium and gallium," describes an etchant that includes sulfuric acid or a salt thereof, combined with a carboxylic acid (excluding oxalic acid) or a salt thereof. This formulation ensures a preferred etching rate, effective residue removal, and low corrosiveness to wiring materials. Notably, the etchant maintains its performance even when the concentration of dissolved oxides increases.

Career Highlights

Mari Usui is associated with Mitsubishi Gas Chemical Company, Inc., where she has been instrumental in advancing etching technologies. Her work has not only contributed to the company's research and development efforts but has also positioned her as a key figure in the field of materials science.

Collaborations

Throughout her career, Mari has collaborated with notable colleagues, including Hidenori Takeuchi and Kunio Yube. These partnerships have fostered innovation and have led to advancements in etching processes and materials.

Conclusion

Mari Usui's contributions to etching technology exemplify her role as a leading inventor in her field. Her innovative patent and collaborations highlight her commitment to advancing materials science and technology.