Location History:
- Arlington, MA (US) (1982 - 1983)
- Waltham, MA (US) (1984 - 1986)
Company Filing History:
Years Active: 1982-1986
Title: The Innovative Contributions of Marcus R. Hatch
Introduction
Marcus R. Hatch is a notable inventor based in Arlington, MA (US). He has made significant contributions to the field of imaging systems and scanning technology. With a total of 4 patents to his name, Hatch's work reflects a commitment to advancing optical technologies.
Latest Patents
Hatch's latest patents include the "Reflective Schmidt system with nonrotationally symmetric corrector" and "One dimensional scanning system." The Reflective Schmidt system patent describes a method for achieving wide field of view correction for wide spectral band imaging systems. This is accomplished through the use of a fold mirror that also serves as a corrector plate. The patent outlines a method for fabricating this corrector plate, showcasing Hatch's innovative approach to optical design. The One dimensional scanning system patent details a scanning system that incorporates input optics, output optics, and a scanner featuring a hollow inwardly reflecting polygonal prism. This design allows for efficient scanning while maintaining high-quality imaging.
Career Highlights
Marcus R. Hatch is currently associated with Honeywell GmbH, where he continues to develop cutting-edge technologies. His work at Honeywell has positioned him as a key player in the field of optical engineering.
Collaborations
Hatch has collaborated with esteemed colleagues such as Irving R. Abel and William J. Lepsevich. These partnerships have further enriched his work and contributed to the success of his innovative projects.
Conclusion
Marcus R. Hatch's contributions to the field of imaging and scanning technologies are noteworthy. His patents reflect a deep understanding of optical systems and a dedication to innovation. Through his work at Honeywell and collaborations with other experts, Hatch continues to push the boundaries of technology.