Richterswil, Switzerland

Marcus Duelk

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Exalos Ag. Active years: 2014-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marcus Duelk. Retrieved from https://idiyas.com/inventor/marcus-duelk-68c0zfy0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2014-2015

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2 patents (USPTO):Explore Patents

Title: **Innovative Inventor Marcus Duelk from Richterswil, CH**

Introduction

Marcus Duelk, an accomplished inventor based in Richterswil, Switzerland, has made significant contributions to the field of optical technology. With a total of two patents to his name, his work showcases innovation in the design and functionality of light sources and optical coherence tomography systems.

Latest Patents

Duelk's recent patents include a **light source** and an **optical coherence tomography module**. The optical coherence tomography module features a swept wavelength light source, with an integrated wavemeter designed to improve measurement accuracy. The wavemeter effectively diverts a portion of light from the main beam, utilizing a wavelength selective filter and two detectors to gauge transmitted and reflected radiation intensities. This sophisticated setup enhances the capabilities of optical coherence tomography apparatuses, ensuring precise imaging applications.

Career Highlights

Throughout his career, Marcus Duelk has demonstrated his skill in creating groundbreaking optical solutions. His patents reflect deep insights into semiconductor gain devices and optical resonator configurations, establishing him as a prominent figure in the innovation of light technologies. His innovative spirit continues to drive advancements in optical coherence applications.

Collaborations

Working at Exalos AG, Duelk has collaborated with talented colleagues such as Jan Lewandowski and Christian Velez. Together, they contribute to the dynamic research environment, fostering creativity and innovation in optical technology.

Conclusion

Marcus Duelk stands out as an inventive mind in the realm of optical technologies, continuously pushing the boundaries of what is possible through his patent contributions. His work not only exemplifies individual ingenuity but also highlights the collaborative nature of innovation within the field. As we look to the future, Duelk's contributions will undoubtedly inspire further developments in optical coherence and light source technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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