Location History:
- New York, NY (US) (1997)
- Fairfield, CT (US) (2001)
Company Filing History:
2 out of 164,197 
1 out of 30,045 
Years Active: 1997-2001
Title: The Innovative Contributions of Marc Jay Weiss
Introduction
Marc Jay Weiss is a notable inventor based in New York, NY (US). He has made significant contributions to the field of etching processes, holding a total of 2 patents. His work has advanced the understanding and application of precise endpoint detection and isotropic silicon etch processes.
Latest Patents
One of Weiss's latest patents is titled "Precise endpoint detection for etching processes." This invention involves the formation of a homogeneous marker at the surface of a deposited material during plasma-enhanced chemical vapor deposition. The marker, created by the adsorption of trace amounts of ambient materials, allows for improved accuracy in determining the endpoint of the etching process. The markers do not significantly affect the electrical, chemical, or optical properties of the deposited material, maintaining its homogeneity.
Another significant patent is the "Isotropic silicon etch process that is highly selective to tungsten." This method focuses on a back-end dry etch process where a mask oxide and temporary silicon mandrel are etched selectively to tungsten and silicon. The process utilizes a polymerizing oxide etch and HBr as the single species etchant, allowing for precise control over the etching duration, pressure, and electrode gaps.
Career Highlights
Throughout his career, Marc Jay Weiss has worked with prominent companies such as IBM and Siemens Aktiengesellschaft. His experience in these organizations has contributed to his expertise in the field of semiconductor manufacturing and etching technologies.
Collaborations
Weiss has collaborated with notable professionals in his field, including Lawrence Andrew Kropp and David Stanasolovich. These collaborations have further enriched his work and innovations.
Conclusion
Marc Jay Weiss's contributions to the field of etching processes demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology in semiconductor manufacturing.