Mao Minoura

Title: Mao Minoura: Innovator in Chalcogenide-Containing Precursors

Introduction

Mao Minoura is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative work on chalcogenide-containing precursors.

Latest Patents

Mao Minoura holds 1 patent for his invention titled "Chalcogenide-containing precursors, methods of making, and methods of using the same for thin film deposition." This patent discloses chalcogenide-containing precursors that are essential for the manufacture of semiconductor, photovoltaic, LCD-TFT, or flat panel type devices. The patent also outlines methods for synthesizing these precursors and vapor deposition techniques, particularly thermal ALD, to form chalcogenide-containing films.

Career Highlights

Mao Minoura is currently employed at L'air Liquide Société Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude, a company known for its expertise in gas technologies and related processes. His work at this organization has allowed him to further develop his innovative ideas and contribute to advancements in thin film deposition technologies.

Collaborations

Mao collaborates with talented individuals such as Julien Gatineau and Hana Ishii, who bring diverse expertise to their projects. Their teamwork enhances the innovative potential of their research and development efforts.

Conclusion

Mao Minoura's contributions to the field of semiconductor manufacturing through his patented innovations highlight his role as a key inventor in this area. His work continues to influence advancements in technology and manufacturing processes.