Bologna, Italy

Manuela Melucci


 

Average Co-Inventor Count = 5.4

ph-index = 1


Location History:

  • Bologna BO, IT (2016)
  • Bologna, IT (2016 - 2017)

Company Filing History:


Years Active: 2016-2025

Loading Chart...
Loading Chart...
5 patents (USPTO):Explore Patents

Title: Manuela Melucci: Innovator in Semiconductor and Substrate Treatment Technologies

Introduction

Manuela Melucci is a prominent inventor based in Bologna, Italy. She has made significant contributions to the fields of semiconductor materials and substrate treatment technologies. With a total of five patents to her name, her work has garnered attention for its innovative approaches and practical applications.

Latest Patents

Melucci's latest patents include a method for the treatment of a porous substrate. This method involves a substrate that comprises hollow fiber membranes, each with a side wall made of a base material, and an inner lumen. The base material consists of polysulfone or a derivative thereof. The substrate is treated with graphene oxide in the presence of a liquid, resulting in an intermediate compound. This compound undergoes thermal treatment to fix the graphene oxide to the substrate, yielding a treated material with enhanced properties. Another notable patent describes novel compounds useful as organic semiconductor materials, along with semiconductor devices that incorporate these materials.

Career Highlights

Throughout her career, Melucci has worked with various organizations, including E.T.C. S.r.l. and the National Research Council of Italy (Consiglio Nazionale Delle Ricerche). Her work has been instrumental in advancing the understanding and application of semiconductor technologies.

Collaborations

Melucci has collaborated with notable colleagues such as Massimo Zambianchi and Laura Favaretto. These partnerships have contributed to her innovative research and development efforts.

Conclusion

Manuela Melucci stands out as a key figure in the innovation of semiconductor and substrate treatment technologies. Her patents reflect her commitment to advancing these fields and her contributions continue to influence future developments.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…