Manabu Ishibashi

Title: Manabu Ishibashi: Innovator in Semiconductor Technology

Introduction

Manabu Ishibashi is a prominent inventor based in Itami, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to photomask design and manufacturing processes.

Latest Patents

Ishibashi's latest patents include a photomask, manufacturing apparatus, and method of semiconductor device using the same. This photomask is designed to maintain a large depth of focus, even when four main features are arranged randomly. The design incorporates four annularly arranged main features based on circuit feature design information, with a sub-feature strategically placed at the intersection of two diagonal lines of a quadrangle formed by the main features. This innovative layout enhances the depth of focus, allowing for greater flexibility in feature arrangement. Another patent focuses on a photomask that suppresses deterioration of depth of focus when main features are arranged randomly. This design replaces sub-features with a quadrangular sub-feature, optimizing the manufacturing process for semiconductor devices.

Career Highlights

Manabu Ishibashi is currently employed at Renesas Electronics Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced manufacturing techniques that improve the efficiency and effectiveness of semiconductor devices.

Collaborations

Ishibashi collaborates with talented coworkers, including Ayumi Minamide and Akemi Moniwa, who contribute to the innovative environment at Renesas Electronics Corporation.

Conclusion

Manabu Ishibashi's contributions to semiconductor technology through his patents and work at Renesas Electronics Corporation highlight his role as a key innovator in the field. His advancements in photomask design are paving the way for future developments in semiconductor manufacturing.