Company Filing History:
Years Active: 2013-2021
Title: Mamoru Oishi: Innovator in Substrate Processing Technology
Introduction
Mamoru Oishi is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of substrate processing technology, holding 2 patents that showcase his innovative approach to engineering solutions.
Latest Patents
Oishi's latest patents include a substrate processing apparatus and a vibration detection system, along with a non-transitory computer-readable recording medium. The substrate processing apparatus is designed to enhance safety by indicating the gas flow of a gas pipe before an electromagnetic valve is opened. This feature prevents incorrect manipulations and hazards from undesired gas mixing. The apparatus includes a placement part for substrate containers, a substrate retainer, transfer mechanisms for substrate movement, and a detector to monitor vibrations. The vibration detection system is equipped with a memory device that registers natural frequencies and threshold values, ensuring that any excessive vibrations are promptly identified.
Career Highlights
Throughout his career, Mamoru Oishi has worked with prominent companies such as Hitachi Kokusai Electronics and Kokusai Electric Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in substrate processing technologies.
Collaborations
Oishi has collaborated with talented individuals in his field, including Tomoyuki Yamada and Kanako Kitayama. These partnerships have fostered innovation and the development of cutting-edge technologies.
Conclusion
Mamoru Oishi's work in substrate processing technology exemplifies his commitment to innovation and safety in engineering. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a valuable contributor to the field.