Berkeley, CA, United States of America

Malcolm S Howells


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: **Malcolm S. Howells: Innovating X-ray Lithography**

Introduction

Malcolm S. Howells, based in Berkeley, California, is an accomplished inventor known for his significant contributions to the field of X-ray lithography. With one patent to his name, he has developed innovative methods that push the boundaries of technology and imaging.

Latest Patents

Howells holds a patent for "X-ray lithography using holographic images." This groundbreaking method enables the formation of X-ray images with a minimum line width of 0.25 μm on X-ray sensitive materials. His invention involves projecting a holographic image of a desired circuit pattern onto a wafer or other image-receiving substrates to record intricate designs in photoresist material. Notably, one embodiment of the method employs on-axis transmission to utilize a high flux X-ray source with manageable monochromaticity and coherence requirements. Additionally, a second embodiment explores off-axis holography, utilizing grazing incidence reflection from a hologram printed on a highly reflective surface. This method requires an X-ray beam that achieves high monochromaticity and spatial coherence.

Career Highlights

Malcolm Howells has dedicated his career to advancing research and development at the Lawrence Berkeley Laboratory, part of the University of California. His expertise and innovative spirit have positioned him as a notable figure in the scientific community, particularly in the specialized domain of lithographic technology.

Collaborations

Throughout his career, Howells has collaborated with esteemed colleagues, including Chris Jacobsen. These partnerships have contributed to the refinement of his ideas and the successful application of his patented technologies.

Conclusion

In summary, Malcolm S. Howells exemplifies the spirit of innovation within the field of X-ray lithography. His patent on holographic imaging methods not only demonstrates his ingenuity but also represents a significant advancement in the capabilities of imaging technologies. As research continues to evolve, Howells’ contributions will undoubtedly inspire future developments in the realm of X-ray lithography.

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