Makoto Fukutomi

Title: Makoto Fukutomi: Innovator in Micro-Patterning Technology

Introduction

Makoto Fukutomi is a notable inventor based in Shinnanyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of micro-patterning. His innovative methods have paved the way for advancements in the manufacturing of integrated circuits.

Latest Patents

Fukutomi holds a patent for a method for forming micro-patterns by development. This method involves creating micro-patterns on base plates used in semiconductor integrated circuits. A radiation-sensitive negative resist film is applied to the base plate and irradiated according to specific pattern designs. The non-irradiated portions of the film are then dissolved using a liquid developer that consists of a mixture of a good solvent and a poor solvent. This technique minimizes swelling of the irradiated portions and accelerates the dissolution of the non-irradiated portions, resulting in high-quality micro-patterns with excellent edge shape.

Career Highlights

Throughout his career, Fukutomi has worked with prominent companies, including Nippon Telegraph and Telephone Corporation and Toyo Soda Manufacturing Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technologies and micro-patterning methods.

Collaborations

Fukutomi has collaborated with notable colleagues such as Mitsutoshi Fukuda and Osamu Kogure. Their combined efforts have further advanced the field of micro-patterning and semiconductor manufacturing.

Conclusion

Makoto Fukutomi's innovative methods in micro-patterning technology have significantly impacted the semiconductor industry. His contributions continue to influence advancements in integrated circuit manufacturing.