M Uenia Crithfield

Title: M Uenia Crithfield: Innovator in Wafer Position Error Detection

Introduction

M Uenia Crithfield is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of wafer handling systems. His innovative work has led to the development of a patented technology that enhances the precision of wafer positioning.

Latest Patents

M Uenia Crithfield holds a patent for a "Wafer position error detection and correction system." This system is designed to determine the presence of a wafer on a wafer transport robot blade. It monitors the position of the wafer relative to the blade using sensors located near the entrances of process chambers. When a position error is detected, the system can correct the misalignment or alert an operator for intervention. The technology incorporates a transparent cover on the wafer handling chamber and utilizes optical detection sensors to ensure accurate positioning.

Career Highlights

Crithfield is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on improving wafer handling processes, which are critical for the efficiency and accuracy of semiconductor manufacturing. His innovative solutions have contributed to advancements in the field, making him a valuable asset to his team.

Collaborations

M Uenia Crithfield has collaborated with notable colleagues such as Frederik W Freerks and Lloyd M Berken. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor sector.

Conclusion

M Uenia Crithfield's contributions to wafer position error detection systems exemplify his commitment to innovation in semiconductor manufacturing. His work not only enhances the efficiency of wafer handling but also sets a standard for future advancements in the industry.