Lynn Sheehan

Title: Lynn Sheehan: Innovator in Carbon Nanotube Technology

Introduction

Lynn Sheehan is a prominent inventor based in Barndarrig, Ireland. She has made significant contributions to the field of carbon nanotube technology, holding 2 patents that showcase her innovative approach to material science.

Latest Patents

One of her latest patents is focused on the laser patterning of a carbon nanotube layer. This method involves providing a substrate that comprises a carbon nanotube layer, generating a laser beam, and directing it onto the first surface of the carbon nanotube layer. By causing relative movement between the laser beam and the surface, at least one cavity feature is formed. Another notable patent involves the deposition of carbon nanotubes onto a substrate. In this process, an at least partially porous film is prepared, which has a layer of carbon nanotubes. The film is positioned in relation to the substrate surface, and pressure is applied to attach the film, including the carbon nanotube layer, to the substrate.

Career Highlights

Lynn is currently employed at Hewlett-Packard Development Company, L.P., where she continues to push the boundaries of technology and innovation. Her work has been instrumental in advancing the applications of carbon nanotubes in various industries.

Collaborations

Lynn collaborates with talented individuals such as Kevin Dooley and Rory Jordan, contributing to a dynamic and innovative work environment.

Conclusion

Lynn Sheehan's contributions to carbon nanotube technology exemplify her dedication to innovation and excellence in her field. Her patents reflect her expertise and commitment to advancing material science.