Company Filing History:
1 out of 832,891 Years Active: 2001
Title: Innovations of Lung-Hu Lin in Chemical-Mechanical Polishing Technology.
Introduction
Lung-Hu Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical-mechanical polishing, a critical process in semiconductor manufacturing. His innovative approach has led to the development of a unique device that enhances the efficiency and effectiveness of polishing processes.
Latest Patents
Lung-Hu Lin holds a patent for a chemical-mechanical polishing device. This device is designed for use with a chemical polishing table that spins in a fixed direction, along with a polishing pad positioned above it. The invention comprises a main body of conditioner featuring multiple mounting pads, each equipped with diamond granules. These granules are strategically located on the lower surface of the conditioner and are distributed around the rim of the main body. The device is engineered to contact polishing pads during the cleaning process, utilizing de-ionized water that flows through cavities in the conditioner to wash away harmful slurries. This innovative design helps to prolong the durability of the conditioner and improve the overall polishing process.
Career Highlights
Throughout his career, Lung-Hu Lin has demonstrated a commitment to advancing technology in the semiconductor industry. His work on the chemical-mechanical polishing device showcases his expertise and innovative thinking. With a patent count of 1 patent, he continues to contribute to the field through his research and development efforts.
Collaborations
Lung-Hu Lin has collaborated with notable colleagues, including Joseph Tung and Ming-Cheng Yang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Lung-Hu Lin's contributions to the field of chemical-mechanical polishing highlight his role as an influential inventor. His patented device represents a significant advancement in polishing technology, showcasing his dedication to improving processes within the semiconductor industry.