Company Filing History:
Years Active: 2025
Title: Innovations of Luke M Davis in Copper Halide Layers
Introduction
Luke M Davis is an accomplished inventor based in Cambridge, MA (US). He has made significant contributions to the field of materials science, particularly through his innovative work on copper halide layers. His research focuses on the interfacial properties of materials, which has implications for various applications in technology and engineering.
Latest Patents
Luke M Davis holds a patent for his invention related to copper halide layers. The patent describes articles that include a substrate and a copper halide layer on the substrate. The interfacial free energy between the substrate and the copper halide layer allows the copper halide layer to form continuously, conforming to the shape of the substrate. Additionally, the articles may include an adhesion layer positioned between the substrate and the copper halide layer. The surface free energy between the adhesion layer and the copper halide layer also facilitates continuous formation, ensuring that either the copper halide layer or the adhesion layer conforms to the substrate's shape. The patent further outlines methods for forming these articles using chemical vapor deposition.
Career Highlights
Luke M Davis is affiliated with Harvard College, where he conducts his research and development work. His innovative approach to material science has garnered attention in academic and industrial circles alike. His patent reflects his commitment to advancing the understanding and application of copper halide materials.
Collaborations
Luke has collaborated with notable colleagues, including Christina M Chang and Roy Gerald Gordon. Their combined expertise contributes to the advancement of research in the field of materials science.
Conclusion
Luke M Davis is a prominent inventor whose work on copper halide layers showcases his innovative spirit and dedication to material science. His contributions have the potential to influence various technological advancements in the future.