Company Filing History:
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2 out of 832,718 Years Active: 2013-2015
Title: Lujie Qu: Innovator in Photolithography Systems
Introduction
Lujie Qu is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of photolithography, particularly in the development of advanced maskless exposure systems. With a total of three patents to his name, Qu's work is at the forefront of innovation in display technology.
Latest Patents
Lujie Qu's latest patents include an "Ultra-large size flat panel display maskless photolithography system and method." This innovative system features multiple maskless optical engines arranged in an (N×M) matrix, which form and project patterns onto a substrate. The first stage system drives the optical engines in one direction, while a second stage system holds and moves the substrate in a perpendicular direction. A control system processes data and synchronizes the movements of both stages, complemented by a vision system that detects the positions of the second stage to ensure precise alignment with the optical engines.
Another notable patent is the "Double-sided maskless exposure system and method." This system consists of light sources with two light wavelength segments and maskless optical engines that utilize a spatial light modulator device, such as DMD, to generate pixel arrays of patterns. The system includes two optical engines with an auto-calibration function to correct alignment errors in real-time. Each optical engine patterns one side of the substrate, allowing for the creation of contiguous images on both sides.
Career Highlights
Throughout his career, Lujie Qu has worked with various companies, including Butterfly Technology (Shenzhen) Limited. His expertise in photolithography systems has positioned him as a key player in the industry, driving advancements in display technology.
Collaborations
Lujie Qu has collaborated with notable professionals in his field, including Wenhui Mei and Weichong Du. These collaborations have further enhanced his innovative projects and contributed to the development of cutting-edge technologies.
Conclusion
Lujie Qu's contributions to the field of photolithography are significant and impactful. His innovative patents and collaborations highlight his role as a leading inventor in advanced display technologies.
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