Carnaxide, Portugal

Luis Paulo Da Mota Capitao Lemos Alves

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovations of Luis Paulo Da Mota Capitao Lemos Alves

Introduction

Luis Paulo Da Mota Capitao Lemos Alves is a notable inventor based in Carnaxide, Portugal. He has made significant contributions to the field of nanotechnology, particularly in the fabrication of two-dimensional nanostructures. His innovative work has led to the development of a unique process that utilizes plasma technology.

Latest Patents

One of his most recent patents is titled "Process, reactor and system for fabrication of free-standing two-dimensional nanostructures using plasma technology." This invention relates to a method for producing self-standing two-dimensional nanostructures through a microwave-excited plasma environment. The process involves injecting a mixture of gases and precursors into a reactor, where it is subjected to a surface wave electric field. This method generates high energy density plasmas that break down the precursors into their atomic and molecular constituents. The system includes a plasma reactor with various zones designed to control temperature and gas stream velocity.

Career Highlights

Luis Paulo Da Mota Capitao Lemos Alves is affiliated with Instituto Superior Técnico, where he continues to advance his research in nanotechnology. His work has garnered attention for its potential applications in various industries, including electronics and materials science.

Collaborations

He has collaborated with notable colleagues such as Elena Stefanova Tatarova and Julio Paulo Dos Santos Duarte Vieira Henriques, contributing to a dynamic research environment that fosters innovation.

Conclusion

Luis Paulo Da Mota Capitao Lemos Alves exemplifies the spirit of innovation in the field of nanotechnology. His contributions through patents and collaborative efforts highlight the importance of research in advancing technological frontiers.

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