Jersey City, NJ, United States of America

Luis M Casas


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: The Innovations of Luis M. Casas

Introduction

Luis M. Casas is an accomplished inventor based in Jersey City, NJ. He has made significant contributions to the field of measurement technology, particularly in the area of thin film thickness measurement. His innovative approach has garnered attention within the scientific community.

Latest Patents

One of his notable patents is a method for measuring thin film thickness. This method provides a simple and effective way to determine the thickness of layers as thin as 1-2 nm. Although the method is destructive, it consumes very little material, making it a valuable tool in various applications. Luis holds 1 patent for this invention.

Career Highlights

Luis M. Casas works for the U.S. Government as represented by the Secretary of the Army. His role involves applying his expertise in measurement techniques to support various military and research initiatives. His work has been instrumental in advancing the understanding of material properties.

Collaborations

Luis has collaborated with notable colleagues, including Donald W. Eckart and Richard T. Lareau. These partnerships have allowed him to enhance his research and contribute to innovative solutions in his field.

Conclusion

Luis M. Casas exemplifies the spirit of innovation through his work in measurement technology. His contributions, particularly in thin film thickness measurement, highlight the importance of precision in scientific research and applications.

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