Lu You

Title: Innovations of Lu You in Vapor Deposition Technology

Introduction

Lu You is an accomplished inventor based in Troy, NY (US), known for her significant contributions to the field of vapor deposition technology. With a focus on creating advanced polymer films, her work has implications in various industries, including electronics and materials science.

Latest Patents

Lu You holds a patent for the invention titled "Vapor deposition of parylene-F using 1,4-bis (trifluoromethyl) benzene." This innovative process involves forming a PA-F polymer film through a mixture of 1,4-bis (trifluoromethyl) benzene (TFB) and a halogen initiator. The method utilizes a low-pressure reactor containing a metal catalyst, operating at temperatures between 200°C to 700°C and pressures below one torr. The substrate is cooled to a temperature ranging from -30°C to room temperature, allowing for the polymerization of the reactive monomer. The halogen initiator, preferably dibromotetrafluoro-p-xylene (DBX), is used in a proportion of about 1 to 5% by volume relative to the TFB/halogen initiator mixture.

Career Highlights

Lu You is affiliated with Rensselaer Polytechnic Institute, where she continues to advance her research in polymer technology. Her innovative approach to vapor deposition has garnered attention in the scientific community, showcasing her expertise and dedication to her field.

Collaborations

Lu You has collaborated with notable colleagues, including Guang-Rong Yang and Toh-Ming Lu, contributing to the advancement of research in vapor deposition and polymer films.

Conclusion

Lu You's work in vapor deposition technology exemplifies her innovative spirit and commitment to advancing materials science. Her patent on the vapor deposition of parylene-F highlights her contributions to the field and the potential applications of her research.