Company Filing History:
Years Active: 2007
Title: **Lothar Risoh: Innovating in Semiconductor Technology**
Introduction
Lothar Risoh is a notable inventor based in Neubiberg, Germany, recognized for his contributions to the field of semiconductor technology. With one patent to his name, his work has significantly impacted the efficiency and functionality of semiconductor circuits.
Latest Patents
Lothar Risoh's patent titled "Semiconductor substrate and semiconductor circuit formed therein and fabrication methods" focuses on the advancement of semiconductor substrates and circuits. This innovation includes a multiplicity of depressions embedded with a respective dielectric layer and a capacitor electrode, designed to realize buried capacitors in a carrier substrate. Importantly, the actual semiconductor component layer is insulated from the carrier substrate by an insulation layer, enhancing the overall performance and reliability of semiconductor devices.
Career Highlights
Lothar Risoh has contributed to the semiconductor industry through his role at Infineon Technologies AG. His expertise in semiconductor technology and circuit fabrication methods showcases his commitment to driving innovation within the industry.
Collaborations
Throughout his career, Lothar has collaborated with esteemed colleagues such as Franz Hofmann and Volker Lehmann. These partnerships have further fostered advancements in semiconductor technology, emphasizing the importance of teamwork in innovation.
Conclusion
Lothar Risoh's dedication to semiconductor innovation and his patent work reflect a significant contribution to the technology sector. His ongoing collaborations and commitment to advancing semiconductor circuits position him as a valued inventor in this ever-evolving field.