Hsinchu, China

Lok-Man Ng


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):

Title: Innovations by Lok-Man Ng

Introduction

Lok-Man Ng is an accomplished inventor based in Hsinchu, CN. He has made significant contributions to the field of garment technology, particularly in the area of high-visibility clothing. His innovative approach combines functionality with safety, making his work highly relevant in various industries.

Latest Patents

One of Lok-Man Ng's notable patents is for a "Retroreflective apertured fabric and garment." This invention features a breathable, high-visibility garment that comprises an apertured fabric and a non-occlusive, unsupported, retroreflective laminate. This laminate is adhesively bonded to an outer major surface of at least one region of the apertured fabric, enhancing visibility and safety for the wearer.

Career Highlights

Lok-Man Ng is associated with 3M Innovative Properties Company, where he continues to develop innovative solutions in fabric technology. His work has garnered attention for its practical applications and contributions to safety in various environments.

Collaborations

He has collaborated with notable colleagues, including Michael A Mccoy and Shri Niwas, who is a woman. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Lok-Man Ng's contributions to the field of garment technology exemplify the importance of innovation in enhancing safety and functionality. His work continues to inspire advancements in high-visibility clothing.

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