Lisa K Figge

Title: The Innovative Contributions of Lisa K Figge

Introduction

Lisa K Figge is a prominent inventor based in Menlo Park, CA, known for her significant contributions to the field of siloxane resins and dielectric films. With a total of 12 patents to her name, she has made remarkable advancements in the synthesis and application of these materials in electronic devices.

Latest Patents

Among her latest patents, Figge has developed novel processes for preparing hydridosiloxane and organohydridosiloxane resins. These processes involve contacting a silane monomer with a phase transfer catalyst in a reaction mixture that includes both nonpolar and polar solvents. This innovative method allows for the efficient catalytic conversion of silane monomers into valuable resin products. Additionally, she has patented a process for using siloxane dielectric films in the integration of organic dielectric films in electronic devices. This invention focuses on the production of dual-layered dielectric films, which are essential for the manufacture of integrated circuits.

Career Highlights

Throughout her career, Figge has worked with notable companies such as AlliedSignal Inc. and Honeywell International Inc. Her experience in these organizations has contributed to her expertise in the field of materials science and engineering.

Collaborations

Some of her notable coworkers include Nigel P Hacker and Scott P Lefferts, who have collaborated with her on various projects, enhancing the innovation landscape in their respective fields.

Conclusion

Lisa K Figge's contributions to the field of siloxane resins and dielectric films have established her as a leading inventor. Her innovative processes and dedication to advancing technology continue to impact the electronics industry significantly.