Niskayuna, NY, United States of America

Linda Schadler Feist


Average Co-Inventor Count = 6.5

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Clifton Park, NY (US) (2011)
  • Niskayuna, NY (US) (2015)

Company Filing History:


Years Active: 2011-2015

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2 patents (USPTO):Explore Patents

Title: Linda Schadler Feist: Innovator in Silicone-Based Nanocomposites

Introduction

Linda Schadler Feist is a prominent inventor based in Niskayuna, NY (US). She has made significant contributions to the field of materials science, particularly in the development of silicone-based nanocomposites. With a total of 2 patents to her name, her work has implications for various high-tech applications.

Latest Patents

One of her latest patents focuses on silicone-based nanocomposites that include a plurality of multimodal nanoparticles dispersed within a silicone-based polymeric matrix. This innovative composite features multimodal nanoparticles with long and short silicone-compatible polymeric chains, enhancing the material's properties. Another notable patent involves a field grading material that includes a polymeric matrix with a filler composed of particles smaller than or equal to 100 nm. This material is designed for grading electric fields in high-voltage applications, showcasing her expertise in advanced materials.

Career Highlights

Linda has worked with esteemed institutions such as the University of South Carolina and Abb Research Ltd. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking research in her field.

Collaborations

Throughout her career, Linda has collaborated with notable colleagues, including Richard W. Siegel and Brian C. Benicewicz. These partnerships have further enriched her research and innovation efforts.

Conclusion

Linda Schadler Feist is a trailblazer in the field of silicone-based nanocomposites, with her patents reflecting her innovative spirit and dedication to advancing materials science. Her contributions continue to influence high-tech applications and inspire future research.

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