Lincoln Eramo, Jr

Title: Lincoln Eramo, Jr.: Innovator in Photoimageable Compositions

Introduction

Lincoln Eramo, Jr. is a notable inventor based in San Clemente, CA (US). He has made significant contributions to the field of photopolymerizable compositions, holding 2 patents that showcase his innovative approach to materials used in printed circuitry.

Latest Patents

Eramo's latest patents include a photoimageable composition having a photopolymerizable binder oligomer. This invention provides an oligomer with tetraacrylate functionality and carboxylic acid functionality, which is particularly useful as a binder in photoresists for forming printed circuitry. The oligomer demonstrates particular advantages in solder mask-forming compositions that must endure the conditions of nickel/gold plating. Another significant patent is a photoimageable composition containing a flexible oligomer. This invention features an oligomer with tetraacrylate functionality that enhances the flexibility of photoimageable compositions functioning as photoresists. The improved flexibility is especially beneficial in epoxy-containing, solder mask-forming photoimageable compositions, as it enhances performance during nickel/gold plating.

Career Highlights

Lincoln Eramo, Jr. is currently associated with Rohm and Haas Company, where he continues to develop innovative materials and compositions. His work has been instrumental in advancing the capabilities of photoresists and solder masks in the electronics industry.

Collaborations

Eramo has collaborated with notable colleagues, including Mitchell G Male and Robert K Barr, contributing to a dynamic environment of innovation and research.

Conclusion

Lincoln Eramo, Jr. stands out as a key figure in the development of advanced photoimageable compositions, with his patents reflecting a commitment to innovation in the field. His contributions continue to influence the industry and pave the way for future advancements.