Lin Yang

Title: Lin Yang: Innovator in Low-k Film Technology

Introduction

Lin Yang is a notable inventor based in Fremont, California. He has made significant contributions to the field of semiconductor technology, particularly in the development of low-k films. His innovative work has led to advancements that enhance the performance and reliability of electronic devices.

Latest Patents

Lin Yang holds a patent for "Methods and apparatus for deposition of low-k films." This patent describes methods and apparatus for forming a conformal SiCON film on a surface. The SiCN film is created on a substrate surface and is then exposed to a low-temperature steam annealing process. This process results in a film that is resistant to damage from rapid thermal processing or ashing. The film undergoes rapid thermal processing and is subsequently subjected to a high-temperature anneal, which forms a film with a low dielectric constant.

Career Highlights

Lin Yang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in the development of advanced materials for electronic applications. His expertise in low-k film technology has contributed to the company's reputation for innovation and excellence.

Collaborations

Lin has collaborated with several talented individuals in his field, including Bhaskar Jyoti Bhuyan and Mark Joseph Saly. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Lin Yang's contributions to the field of semiconductor technology, particularly through his patent on low-k films, highlight his role as an innovator. His work at Applied Materials, along with his collaborations, underscores the importance of teamwork in driving technological advancements. Lin Yang continues to be a significant figure in the realm of electronic materials.