San Jose, CA, United States of America

Licheng Niu


 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2025

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations of Licheng Niu in Lipid Bilayer Formation

Introduction

Licheng Niu is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of nanopore-based sequencing technology. With a total of two patents to his name, Niu's work focuses on innovative methods for lipid bilayer formation.

Latest Patents

One of Licheng Niu's latest patents is titled "Osmotic imbalance methods for bilayer formation." This patent discloses a method for forming multiple lipid bilayers over an array of cells in a nanopore-based sequencing chip. The process involves flowing a first salt buffer solution with a specific osmolarity over a cell to fill a well within the cell. Following this, a lipid and solvent mixture is introduced to deposit a lipid membrane that encloses the first salt buffer solution. A second salt buffer solution with a lower osmolarity is then flowed above the well, creating an osmotic imbalance that reduces the thickness of the lipid membrane.

Career Highlights

Licheng Niu has worked with notable companies in the biotechnology sector, including Roche Sequencing Solutions, Inc. and F. Hoffmann-La Roche AG. His experience in these organizations has contributed to his expertise in the development of advanced sequencing technologies.

Collaborations

Throughout his career, Niu has collaborated with esteemed colleagues such as Geoffrey A. Barrall and Pirooz Parvarandeh. These partnerships have further enhanced his innovative work in the field.

Conclusion

Licheng Niu's contributions to lipid bilayer formation and nanopore-based sequencing technology highlight his role as a significant inventor in the biotechnology industry. His patents reflect a commitment to advancing scientific knowledge and technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…