Liang Ni

Title: The Innovative Contributions of Liang Ni

Introduction

Liang Ni is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent. His work focuses on enhancing the performance of cantilever structures, which are essential in various technological applications.

Latest Patents

Liang Ni holds a patent titled "Method to improve cantilever process performance." This patent describes a method of manufacturing a cantilever structure that involves several key steps. The process begins with providing a semiconductor substrate and forming a recess within it. A sacrificial layer is then created in the recess, followed by the formation of a cantilever structure layer on both the semiconductor substrate and the sacrificial layer. An etching process is performed to remove a portion of the cantilever structure layer, exposing the sacrificial layer's surface. This results in the formation of a cantilever structure and an opening. Finally, a portion of the sacrificial layer is removed to create a void beneath the cantilever structure, allowing it to be suspended. The cantilever structure produced through this method exhibits excellent morphological properties, ensuring it is free of residues and maintains exceptional suspension, even with a relatively large width.

Career Highlights

Throughout his career, Liang Ni has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation and Schneider Electric Industries. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Liang Ni has collaborated with several professionals in his field, including Xinxue Wang and Juan Xia. These collaborations have likely enriched his work and contributed to the advancements in semiconductor manufacturing processes.

Conclusion

Liang Ni's innovative patent and career achievements highlight his significant contributions to the field of semiconductor manufacturing. His work continues to influence the development of advanced technologies in this area.