Hsinchu, Taiwan

Liang-Kai Chen

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2014-2017

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6 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Liang-Kai Chen

Introduction: Liang-Kai Chen is a prominent inventor based in Hsinchu, Taiwan, known for his significant contributions to the field of antenna technology. With a total of six patents to his name, Chen continues to push the boundaries of innovation through his work at Wistron Neweb Corporation.

Latest Patents: Among his latest inventions, Chen has developed an advanced antenna structure and a unique loop antenna. The antenna structure features a ferromagnetic patch with first and second metal conductive lines, along with metal connection elements that enhance its functionality. His loop antenna design includes multiple interconnected sections, shaped to define an empty area while creating an optimal structure for signal reception.

Career Highlights: Throughout his career, Liang-Kai Chen has focused on innovative designs that significantly advance mobile communication technologies. His role at Wistron Neweb Corporation has allowed him to explore and implement ideas that have potential applications in a variety of electronic devices.

Collaborations: Chen has worked alongside talented colleagues such as Ching-Chia Mai and Jen-Hao Cheng, contributing to a collaborative environment that fosters creativity and technical excellence. These collaborations have resulted in synergistic innovations that benefit the company's goals and reinforce its competitive edge in the tech industry.

Conclusion: Liang-Kai Chen exemplifies the spirit of innovation and dedication in antenna technology. His contributions at Wistron Neweb Corporation, combined with his strong network of collaborators, continue to pave the way for cutting-edge advancements in mobile devices. As he progresses, his work will undoubtedly have a lasting impact in the field, inspiring future inventors and engineers.

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