Company Filing History:
Years Active: 2024
Title: Innovations of Li Wang in Surface-Relief Grating Technology
Introduction
Li Wang is an accomplished inventor based in Brugg, Switzerland. She has made significant contributions to the field of photolithography, particularly in the development of methods for printing periodic patterns. Her innovative approach has led to advancements in surface-relief grating technology.
Latest Patents
Li Wang holds a patent for a "Method and apparatus for printing a periodic pattern with a varying duty cycle." This patent describes a method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist. The process involves providing a first mask with a high-resolution grating, arranging it at a specific distance from a substrate, and using a second mask with a variable-transmission grating. The method utilizes displacement Talbot lithography to achieve precise modulation in the energy density distribution that exposes the photoresist.
Career Highlights
Li Wang is currently employed at Eulitha AG, where she continues to push the boundaries of innovation in her field. Her work has garnered attention for its potential applications in various industries, including optics and materials science.
Collaborations
Li Wang collaborates with notable colleagues such as Francis Clube and Andreas Amrein, contributing to a dynamic research environment that fosters innovation and creativity.
Conclusion
Li Wang's contributions to the field of surface-relief grating technology exemplify the impact of innovative thinking in advancing scientific research. Her patent and ongoing work at Eulitha AG highlight her role as a leading inventor in this specialized area.