Company Filing History:
Years Active: 2025
Title: The Innovative Contributions of Li Lin
Introduction
Li Lin is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of electronics, particularly in the development of reference voltage generator circuits. His work is characterized by a focus on efficiency and reduced manufacturing steps, which is crucial in modern electronic design.
Latest Patents
Li Lin holds a patent for a "Reference Voltage Generator Circuit with Reduced Manufacturing Steps." This innovative circuit includes a first transistor and a second transistor that are coupled with each other and located on a substrate. The first transistor has a first conduction threshold voltage and a first rated voltage, while the second transistor has a second conduction threshold voltage and a second rated voltage. Notably, the first rated voltage is higher than the second rated voltage. The circuit is designed to generate a bandgap reference voltage with temperature compensation based on the difference between the conduction threshold voltages of the two transistors. This patent showcases his ability to enhance circuit design while minimizing production complexity. Li Lin has 1 patent to his name.
Career Highlights
Li Lin is currently employed at Richtek Technology Corporation, where he continues to innovate and contribute to the field of electronics. His work at Richtek has positioned him as a key player in the development of advanced electronic components.
Collaborations
Li Lin collaborates with talented individuals such as Chien-Yu Chen and Cheng-Kuang Lin, who contribute to the innovative environment at Richtek Technology Corporation. Their teamwork fosters creativity and drives the development of cutting-edge technologies.
Conclusion
Li Lin's contributions to the field of electronics, particularly through his patented reference voltage generator circuit, highlight his innovative spirit and dedication to improving electronic design. His work continues to influence the industry and inspire future advancements.