Company Filing History:
Years Active: 2005
Title: The Innovations of Li Kuo Wei
Introduction
Li Kuo Wei is a notable inventor based in Penang, Malaysia. He has made significant contributions to the field of lithography through his innovative patent. His work is recognized for its potential to enhance the precision of substrate alignment in lithographic processes.
Latest Patents
Li Kuo Wei holds a patent for a method titled "Dual phase grating alignment marks." This invention involves aligning a substrate on a lithographic apparatus by utilizing two sets of grating marks. The first set is optimized for a beam of a first given diffraction order, while the second set is optimized for a beam of a second given diffraction order. The process generates signals from beams reflected off these grating marks, allowing for precise alignment of the substrate with respect to the apparatus.
Career Highlights
Li Kuo Wei is currently employed at Silterra Malaysia Sdn. Bhd., where he continues to develop innovative solutions in the field of semiconductor manufacturing. His expertise in lithography has positioned him as a valuable asset to his team and the company.
Collaborations
Li Kuo Wei collaborates with talented individuals such as Lim Chin Teong and Jeong Soo Kim. Their combined efforts contribute to the advancement of technology in their field.
Conclusion
Li Kuo Wei's contributions to lithography through his patent demonstrate his innovative spirit and commitment to advancing technology. His work at Silterra Malaysia Sdn. Bhd. continues to influence the industry positively.