Hopewell Jct., NY, United States of America

Leslie Jane Bohnenkamp


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2000-2002

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3 patents (USPTO):Explore Patents

Title: Innovations by Leslie Jane Bohnenkamp

Introduction

Leslie Jane Bohnenkamp is a notable inventor based in Hopewell Junction, NY (US). She has made significant contributions to the field of semiconductor technology, particularly in the analysis of silicon wafers. With a total of three patents to her name, her work has advanced the methods used in impurity analysis of silicon materials.

Latest Patents

One of her latest patents is titled "Method and apparatus for decomposition of silicon oxide layers for impurity analysis of silicon wafers." This innovative method employs a heated mist of aqueous HF applied to the cooled surface of silicon wafers. The technique allows for the analysis of trace impurities by using a scanning fluid drop to collect the residue after the silicon oxide has been decomposed. This novel approach offers a significant increase in the rate of silicon oxide decomposition compared to previous vapor phase techniques. Additionally, it provides better control and safer handling of corrosive vapors. The apparatus includes a movable dome equipped with a carrier gas supply and a specially designed mist generator that injects the heated aqueous HF mist into the carrier gas flow.

Career Highlights

Throughout her career, Leslie has worked with various companies, including Beech Grove Technology, Inc. Her experience in the industry has allowed her to develop and refine her innovative techniques, contributing to advancements in semiconductor technology.

Collaborations

Leslie has collaborated with notable professionals in her field, including Steve I. Petvai and Michael P. Buet. These collaborations have further enhanced her work and the impact of her inventions.

Conclusion

Leslie Jane Bohnenkamp's contributions to the field of semiconductor technology through her innovative patents demonstrate her expertise and commitment to advancing the industry. Her work continues to influence the methods used in silicon wafer analysis, showcasing the importance of innovation in technology.

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