Leo C Liclican

Title: Innovations of Leo C Liclican

Introduction

Leo C Liclican is a notable inventor based in San Jose, California. He is recognized for his contributions to the field of photoresist technology, particularly in semiconductor manufacturing. His innovative approach has led to the development of a unique masking process that enhances the efficiency of pattern formation in photoresist layers.

Latest Patents

Leo C Liclican holds a patent for a "Single level masking process with two positive photoresist layers." This innovative process utilizes two layers of positive photoresist to create intricate patterns. The first layer is patterned and then treated to ensure its integrity during the application of the second layer. This method allows for the deposition of metals on specific substrate areas, significantly improving the precision of semiconductor fabrication.

Career Highlights

Throughout his career, Leo has made significant strides in the field of semiconductor technology. He is currently associated with International Business Machines Corporation, commonly known as IBM. His work has contributed to advancements in manufacturing processes that are crucial for modern electronics.

Collaborations

Leo has collaborated with esteemed colleagues such as Peter J Duke and Jerry Leff. Their combined expertise has fostered innovation and development in the semiconductor industry.

Conclusion

Leo C Liclican's contributions to the field of photoresist technology exemplify the spirit of innovation. His patented processes continue to influence the semiconductor manufacturing landscape, showcasing the importance of inventive minds in advancing technology.