New City, NY, United States of America

Len-Yuan Tsou


Average Co-Inventor Count = 1.9

ph-index = 3

Forward Citations = 108(Granted Patents)


Location History:

  • New York, NY (US) (1992)
  • New City, NY (US) (1993 - 1997)

Company Filing History:


Years Active: 1992-1997

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3 patents (USPTO):Explore Patents

Title: The Innovations of Len-Yuan Tsou

Introduction

Len-Yuan Tsou is a notable inventor based in New City, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work primarily focuses on advancements in electrically erasable and programmable read-only memory (EEPROM) technologies.

Latest Patents

Among his latest patents, Tsou has developed an electrically erasable and programmable read-only memory with non-uniform characteristics. This invention features an insulated control gate and an insulating floating gate within a trench in a semiconductor body. A dielectric layer is strategically placed along the sidewalls of the trench to separate the floating gate from the semiconductor body. Notably, the thickness of the dielectric layer varies along the sidewalls, enhancing programming speed due to a higher electric field in the gate oxide. Another significant patent involves the selective oxidation of silicon trench sidewalls, allowing for individual oxidation of each sidewall to different thicknesses based on trench IC requirements.

Career Highlights

Throughout his career, Len-Yuan Tsou has worked with prominent companies such as North American Philips Corporation and Philips Electronics North America Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Tsou has collaborated with notable professionals in his field, including Satyendranath Mukherjee and Di-Son Kuo. These collaborations have further enriched his work and contributed to advancements in technology.

Conclusion

Len-Yuan Tsou's contributions to the field of semiconductor technology through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.

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