Company Filing History:
Years Active: 2022
Title: Leihong Pei: Innovator in Ion Implantation Technology
Introduction
Leihong Pei is a prominent inventor based in Shanghai, China. He is known for his contributions to the field of ion implantation technology. His innovative approach has led to advancements that enhance productivity in semiconductor manufacturing.
Latest Patents
Leihong Pei holds a patent for an "Ion implantation method and ion implanter for performing the same." This patent describes a method that involves providing a spot-shaped ion beam current implanted into a wafer. The method includes controlling the wafer to move back and forth in a first direction while the ion beam scans back and forth in a second direction perpendicular to the first. The scanning width of the ion beam is adjusted based on the portion of the wafer currently being scanned. This innovative method significantly reduces the waste of ion beam current, improves effective ion beam current, and increases productivity without raising the actual ion beam current.
Career Highlights
Leihong Pei is associated with Shanghai Huali Integrated Circuit Manufacturing Co., Ltd. His work at this company has been instrumental in advancing ion implantation techniques. His expertise in this area has made him a valuable asset to the organization.
Collaborations
Leihong Pei collaborates with Chaorong Lai, a fellow innovator in the field. Their combined efforts contribute to the ongoing development of advanced technologies in semiconductor manufacturing.
Conclusion
Leihong Pei's contributions to ion implantation technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at Shanghai Huali Integrated Circuit Manufacturing Co., Ltd. highlight his role as a key inventor in this field.