Lei Lu

Title: Lei Lu - Innovator in Photoresist Technology

Introduction

Lei Lu is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of photoresist technology, particularly with his innovative approach to negative-working photoresist compositions. His work is essential for advancements in lithographic imaging processes.

Latest Patents

Lei Lu holds a patent for a negative-working ultra thick film photoresist. This invention involves a photosensitive photoresist composition that is aqueous base developable. The composition includes a polymer with specific repeat units, a radical photo-initiator activated by a broad range of radiation, and various components such as crosslinkers and solvents. This technology is crucial for producing high-quality lithographic images.

Career Highlights

Lei Lu is currently associated with Merck Patent GmbH, where he continues to develop innovative solutions in the field of photoresists. His expertise and dedication to research have positioned him as a key player in the industry.

Collaborations

Lei Lu has collaborated with notable colleagues, including Aritaka Hishida and Hisashi Motobayashi. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies.

Conclusion

Lei Lu's contributions to photoresist technology exemplify the importance of innovation in advancing lithographic processes. His work continues to influence the field and drive future developments.