Lee M Lowenstein

Title: Lee M. Lowenstein: Innovator in Silicon Nitride Processing

Introduction

Lee M. Lowenstein is a notable inventor based in Plano, Texas. He has made significant contributions to the field of semiconductor processing, particularly in the deposition of silicon nitride. His innovative work has led to the development of a unique processing apparatus and method that enhances the efficiency of silicon nitride deposition.

Latest Patents

Lee M. Lowenstein holds a patent for a processing apparatus and method. This invention utilizes a single process chamber for the deposition of silicon nitride with a silicon source. It incorporates a remote plasma that includes a nitrogen source, along with additional ultraviolet energy coupled into the process chamber. This design provides enhanced molecular excitation of the silicon source, improving the overall deposition process.

Career Highlights

Lee is currently employed at Texas Instruments Corporation, a leading company in the semiconductor industry. His work at Texas Instruments has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Throughout his career, Lee has collaborated with esteemed colleagues such as Dean W. Freeman and James B. Burris. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Lee M. Lowenstein's contributions to the field of semiconductor processing exemplify the spirit of innovation. His patent for a processing apparatus and method showcases his commitment to advancing technology in the industry.