Company Filing History:
Years Active: 2001-2004
Title: Lee Erich Burns: Innovator in Wafer Holding and Chemical Vapor Deposition Technologies
Introduction
Lee Erich Burns is a notable inventor based in Winchester, MA (US), recognized for his contributions to semiconductor processing technologies. He holds 2 patents that showcase his innovative approach to engineering solutions in the field.
Latest Patents
One of his latest patents is a wafer holding apparatus designed to securely hold multiple semiconductor wafers during processing. This apparatus consists of a plurality of rods joined at opposite ends by endplates, utilizing mechanical dovetail joints that eliminate the need for sealing or coating agents. The design ensures that the apparatus is oxidation resistant, chemical resistant, and thermal shock resistant, making it ideal for various processing environments.
Another significant patent by Burns involves a method and apparatus for producing coatings or near net shaped monolithic ceramic parts through chemical vapor deposition. This innovative approach minimizes material consumption and machining requirements. The mandrel substrates are specifically designed to create a near net shaped final part, with the tooling installed in a chemical vapor deposition furnace to ensure uniform ceramic deposits.
Career Highlights
Throughout his career, Lee Erich Burns has worked with prominent companies such as Rohm and Haas Company and Tevtech LLC. His experience in these organizations has contributed to his expertise in developing advanced technologies for semiconductor and ceramic processing.
Collaborations
Burns has collaborated with notable professionals in his field, including Thomas Payne and Jitendra Singh Goela. These collaborations have further enriched his work and contributed to the advancement of innovative technologies.
Conclusion
Lee Erich Burns stands out as an influential inventor in the realm of semiconductor processing and chemical vapor deposition technologies. His patents reflect a commitment to innovation and excellence in engineering solutions.