Company Filing History:
Years Active: 1992-1993
Title: Innovations of Lawrence J Gestaut
Introduction
Lawrence J Gestaut is a notable inventor based in Chagrin Falls, OH (US). He has made significant contributions to the field of electroplating, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of electroplating processes.
Latest Patents
Gestaut's latest patents include a "Plate anode having bias cut edges" and a "Process for electroplating." The first patent describes a fixed anode structure with a segmented plate anode that features broad faces, which can be flat or curvilinear. This design allows for better electrodeposition on a moving cathode. The second patent addresses the challenges of metal build-up in electroplating baths, providing a solution through an electrowinning cell that balances the chemical dissolution of the anode with the metal removal from the bath.
Career Highlights
Gestaut is currently associated with Eltech Systems Corporation, where he continues to innovate in the field of electroplating. His work has been instrumental in advancing technologies that enhance the efficiency of metal deposition processes.
Collaborations
Gestaut has collaborated with notable colleagues such as James R Brannan and Anthony J Vaccaro, contributing to various projects that aim to improve electroplating techniques.
Conclusion
Lawrence J Gestaut's contributions to electroplating through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of electroplating technology.