Lawrence C Lei

Title: The Innovative Contributions of Lawrence C. Lei

Introduction

Lawrence C. Lei is a notable inventor based in Mountain View, California. He has made significant contributions to the field of technology, particularly in the area of coating devices. His innovative work has led to the development of a unique patent that enhances the efficiency and effectiveness of sputtering devices.

Latest Patents

Lawrence C. Lei holds a patent for a "Planar magnetron sputtering device with combined circumferential." This device features an extended flat circular target source positioned in an opposed spaced parallel relationship with a generally flat article to be coated, which is placed within an evacuated coating chamber. The device establishes crossed electric and magnetic fields in the chamber to create a plasma adjacent to the target. The magnetic field is generated by a magnetic assembly of permanent magnets located on the non-vacuum side of the target. This assembly is smaller in diameter than the target but is mounted on a mechanism that allows it to move laterally over the entire area of the target. This innovative movement sweeps the magnetic assembly in an eccentric path centered on the target, exposing different areas of the target to the magnetic field at various orientations. As a result, articles are coated with improved uniformity and step coverage, while also enhancing the utilization of target material.

Career Highlights

Lawrence C. Lei has had a distinguished career, working with Varian Associates, Inc. His work at this company has allowed him to focus on advancing technologies related to sputtering devices. His contributions have been instrumental in improving the performance and reliability of these devices in various applications.

Collaborations

Throughout his career, Lawrence has collaborated with notable colleagues, including Kenneth F. Freeman and Charles B. Garrett. These collaborations have fostered an environment of innovation and have contributed to the development of advanced technologies in the field.

Conclusion

Lawrence C. Lei's innovative work in the field of planar magnetron sputtering devices has made a significant impact on technology. His patent reflects a deep understanding of the principles of physics and engineering, leading to advancements that benefit various industries. His contributions continue to influence the development of more efficient coating technologies.