Lawrence C Lane

Title: Innovations by Lawrence C. Lane

Introduction

Lawrence C. Lane is a notable inventor based in San Jose, California. He has made significant contributions to the field of chemical vapor deposition technology. With a total of three patents to his name, Lane's work has advanced the methods used in semiconductor manufacturing.

Latest Patents

One of Lane's latest patents is an "Apparatus for preventing deposition on frontside peripheral region." This invention involves a platen that supports a wafer during the deposition of tungsten, metal nitrides, other metals, and silicides in a chemical vapor deposition reactor. A deposition control gas, which includes a suitable inert gas such as argon or a mixture of inert and reactant gases like argon and hydrogen, is introduced through a restrictive opening into the reactor's ambient. An exclusion guard aligned with the platen extends over the frontside peripheral region of the wafer. The deposition control gas is introduced under this exclusion guard extension and exits through a restrictive opening between the exclusion guard extension and the wafer's frontside peripheral region. This design ensures a uniform pressure of deposition control gas at the edge and frontside of the wafer, effectively preventing deposition on the wafer edge and backside.

Another significant patent by Lane is titled "Exclusion guard and gas-based substrate protection for chemical vapor." This patent shares similar principles with his previous invention, focusing on the introduction of deposition control gas to maintain the integrity of the wafer during the deposition process.

Career Highlights

Throughout his career, Lawrence C. Lane has worked with various companies, including Novellus Systems Incorporated. His experience in the semiconductor industry has allowed him to develop innovative solutions that address critical challenges in wafer processing.

Collaborations

Lane has collaborated with notable professionals in his field, including Everhardus P. Van De Ven and Eliot K. Broadbent. These collaborations have contributed to the advancement of technologies in chemical vapor deposition.

Conclusion

Lawrence C. Lane's contributions to the field of chemical vapor deposition have been instrumental in enhancing semiconductor manufacturing processes. His innovative patents reflect his expertise and commitment to advancing technology in this critical industry.